General Information
PTM Description
N-acetylthreonine
Modified Amino Acid
T
Position of Modification on Amino Acid
protein backbone
Position in the Polypeptide
N-terminal amino group
Correction Formula
C2;H2;O1
Monoisotopic Mass Difference
42.0106
Average Mass Difference
42.04
Localization
cytoplasm, nucleus, mitochondrial matrix, etc. [Detail]
RESID IDAA0052
Formula Structure
Formula 3D Structure
Substrate Site Specificity
Number of Experimentally Validated Sites130
The Matrix of Positional Amino Acid Frequency Surrounding Modified Site
Pos.0+1+2+3+4+5+6
A00.160.140.120.110.10.14
R00.010.030.010.030.030.06
N00.020.040.020.030.030.04
D00.130.050.030.030.060.04
C000.010.030.010.010.01
G00.030.020.040.110.030.05
E00.190.090.110.040.080.02
Q00.020.150.040.020.010.01
H00.0100.030.030.010.03
I00.040.030.020.040.050.03
L00.030.040.10.040.090.16
K00.020.040.070.010.120.02
M00.060.020.040.0400
F000.050.030.020.040.1
P000.030.020.030.080.05
S00.110.070.090.130.120.03
T00.160.060.060.160.060.07
W000.050.010.0100.01
Y000.050.030.010.020.03
V00.020.010.090.090.070.08
Sequence Logo

Average Solvent Accessibility Surrounding Modified Site
Secondary Structure Logo



General Information
PTM Description
O-acetylthreonine
Modified Amino Acid
T
Position of Modification on Amino Acid
amino-acid side chain
Position in the Polypeptide
any position
Correction Formula
C2;H2;O1
Monoisotopic Mass Difference
42.0106
Average Mass Difference
42.04
Localization
cytoplasm, nucleus, mitochondrial matrix, etc. [Detail]
RESID IDAA0423
Formula Structure
Formula 3D Structure
Substrate Site Specificity
Number of Experimentally Validated Sites3
The Matrix of Positional Amino Acid Frequency Surrounding Modified Site
Pos.-6-5-4-3-2-10+1+2+3+4+5+6
A00000.3300000.33000
R0000000000000
N0000000000000
D0.670.330000000.330000
C000000.67000000.330
G000.670000000100
E0000000000000
Q00.6700000000000
H0000000000000
I00000000.3300000
L00000.6700000000.67
K000000.330000000.33
M0000000000000
F000000000.670000
P0000000000000
S000.330.670000.6700000
T000000000000.670
W0000000000000
Y0000000000000
V0.33000.33000000.67000
Sequence Logo

Average Solvent Accessibility Surrounding Modified Site
Secondary Structure Logo